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Titanium Oxides (TiO2 etc)


Plasma Quest Ltd can deposit titanium oxides at high rates and at low temperatures (<70°C) using the proprietary HiTUS thin film sputter deposition equipment. 

Thin films of titanium oxides are deposited by reactive sputtering from a metallic target.  By varying the oxygen partial pressure during the deposition process the film stoichiometry can be controlled – ranging from pure metallic films, through to the conductive corrosion-resistant sub-oxide and the dielectric TiO2.

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