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Alumina (Al2O3)


Alumina (Al<sub>2</sub>O<sub>3</sub>)

The significant number of applications for this material has enabled PQL to build an impressive portfolio through continuing development. We have achieved excellent results through reactive sputtering and have also realised new applications.

  • High deposition rate of high-quality alumina
  • RI very near to bulk properties
  • High electrical breakdown capability
  • Very low stress films (controlled through process conditions)
  • Deposition onto plastic and delicate substrates
  • Also low rate deposition
  • Material properties as high rate
  • Waveguide material
  • UV stable
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