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Magnetic Media

 

Plasma Quest Magnetic Media

PQL's HiTUS process provides substantial improvements in the sputtering of magnetic materials, both from a production and materials point of view:

  • High rate deposition of magnetic materials, including CoFe, NiFe, Co, Fe.
  • Ability to use thick targets – 6mm normally, up to 15mm so far –high target utilisation gives less process down time and reliable run to run performance.
  • Close to bulk material or theoretical ideal.
  • Excellent adhesion deposited onto glass, silicon, oxides, plastics.
  • Low stress films
  • Grain size and thereby magnetic properties control through process modification

Our standard system has been used in multi-target mode to deposit multi-layer GMR films – the capability to repeatedly and reliably deposit identical alternating layers without recourse to thin film monitoring and absence of cross-contamination effects from prior layers has allowed rapid progression of such work.

Download our paper on Preparation of high moment CoFe films with controlled grain size and coercivity.pdf

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