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Barrier Layers


Plasma Quest Ltd (PQL) have developed a process for stable, uniform, high rate deposition of good quality low temperature alumina (Al203) films. Our technology can be used to develop barrier layers suitable for use in OLED devices.

  • Low temperature process (deposition onto flexible)
  • Deposition rate up to 100nm/min.
  • No need for pulsed DC or feedback control (automatic or manual) of the oxygen gas flow.
  • Excellent thickness and optical uniformity (<1% variation across a 6" dia. substrate).
  • Intrinsically low stress, to permit reliable step coverage.
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